Its importance in today's society rests on its ability to be mass-produced using a highly automated process (semiconductor device fabrication) that achieves astonishingly low per-transistor costs.

Since the logical and netlist views are only useful for abstract (algebraic) simulation, and not device fabrication, the physical representation of the standard cell must be designed too.

Reliable device fabrication at modern deep-submicrometer (0.13 m and below) requires strict observance of transistor spacing, metal layer thickness, and power density rules.

The problems arise from the physics of racetrack memory devices, so performance gains must come from an improved scientific understanding of the underlying processes rather than improved device fabrication.

It brings together complementary expertise in molecular design and synthesis, physical characterizations, device fabrications and theoretical modeling from at least five different departments within UMass Amherst.

However, electromigration (EM) continues to be an ever present challenge to device fabrication, and therefore the EM research for copper interconnects is ongoing (though a relatively new field).

All these can further demonstrates the utility of this innovative approach for device fabrication.

With additional processing steps, an aluminum gate would then be formed over the thin-oxide region completing the device fabrication.

Local oxidation nanolithography contributes to the nanometric precision of the device fabrication.

The bandgap of MZT is more sensitive to composition fluctuations than that of MCT, which may be an issue for reproducible device fabrication.