The data suggest that electrons with energies as low as 12 eV can penetrate 50 nm thick polymer photoresist.

An earlier study showed that electrons produced by the 'soft' ionizing radiation could still penetrate 100 nm below the surface, resulting in heating.

In order to ensure against charging, it must be ensured that electrons can penetrate sufficiently to reach the conducting substrate.

The electrons penetrate deeper inside the structure creating images with more depth, more natural 3D-look than the photographic images.

If the outer electron penetrates the inner electron shells, it will 'see' more of the charge of the nucleus and hence experience a greater force.

For this reason, electrons do not penetrate the product beyond a few centimeters, depending on product density.

Although the electrons penetrate only a short distance into the P-type material, the electric current continues uninterrupted, because holes (the majority carriers) begin to flow in the opposite direction.

Some inelastically scattered electrons penetrate the bulk crystal and fulfill Bragg diffraction conditions.

At large incident angles, electrons with high energy can penetrate the surface of the sample and degrade the surface sensitivity of the instrument.

Some electrons penetrate the sample surface and escape into vacuum.